Photomask or wafer compacts: - consisting of antistatic materials or blended thermoplastics proving special electrostatic discharge (ESD) and outgassing properties, - having non porous, abrasion resistant or impact resistant surface properties, - fitted with a specially designed retainer system that protects the photomask or wafers from surface or cosmetic damage and - with or without a gasket seal, of a kind used in the photolithography or other semiconductor production to house photomasks or wafers
The lowest level of the nomenclature: this code goes in the import declaration. An export declaration needs only the first 8 digits.
This code in Finnish Customs' Fintaric ↗Calculate duties and taxes with Fintaric's calculator ↗Duties, taxes and other measures in the EU's TARIC service ↗